Photo Definable High Dielectric Constant Organic/Inorganic Hybrid Material
نویسندگان
چکیده
منابع مشابه
High dielectric constant oxides
The scaling of complementary metal oxide semiconductor (CMOS) transistors has led to the silicon dioxide layer used as a gate dielectric becoming so thin (1.4 nm) that its leakage current is too large. It is necessary to replace the SiO2 with a physically thicker layer of oxides of higher dielectric constant (κ) or ‘high K’ gate oxides such as hafnium oxide and hafnium silicate. Little was know...
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* This work was supported by a grant from the National Science Foundation. 'Yarmolinsky, M. B., and G. L. de la Haba, these PROCEEDINGS, 45, 1721 (1959). 2 Nathans, D., and F. Lipmann, these PROCEEDINGS, 47, 497 (1961). 3Wecker, E., and E. Schonne, these PROCEEDINGS, 47, 278 (1961). 4 Wecker, E., and A. Richter, in Basic Mechanisms in Animal Virus Biology, Cold Spring Harbor Symposia on Quantit...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2008
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.21.113